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Proceedings Paper

The thickness correction of sol-gel coating using ion-beam etching in the preparation of antireflection coating
Author(s): Siyu Dong; Lingyun Xie; Tao He; Hongfei Jiao; Ganghua Bao; Jinlong Zhang; Zhanshan Wang; Xinbin Cheng
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Paper Abstract

For the sol-gel method, it is still challenging to achieve excellent spectral performance when preparing antireflection (AR) coating by this way. The difficulty lies in controlling the film thickness accurately. To correct the thickness error of sol-gel coating, a hybrid approach that combined conventional sol-gel process with ion-beam etching technology was proposed in this work. The etching rate was carefully adjusted and calibrated to a relatively low value for removing the redundant material. Using atomic force microscope (AFM), it has been demonstrated that film surface morphology will not be changed in this process. After correcting the thickness error, an AR coating working at 1064 nm was prepared with transmittance higher than 99.5%.

Paper Details

Date Published: 6 September 2017
PDF: 6 pages
Proc. SPIE 10356, Nanostructured Thin Films X, 103560S (6 September 2017); doi: 10.1117/12.2271633
Show Author Affiliations
Siyu Dong, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Lingyun Xie, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Tao He, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Hongfei Jiao, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Ganghua Bao, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Jinlong Zhang, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Zhanshan Wang, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Shanghai Jiao Tong Univ. (China)
Xinbin Cheng, China Key Lab. of Advanced Micro-Structure Materials (China)
Tongji Univ. (China)
Shanghai Jiao Tong Univ. (China)


Published in SPIE Proceedings Vol. 10356:
Nanostructured Thin Films X
Yi-Jun Jen; Akhlesh Lakhtakia; Tom G. Mackay, Editor(s)

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