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Proceedings Paper

Sub-wavelength transmission and reflection mode tabletop imaging with 13nm illumination via ptychography CDI
Author(s): Michael Tanksalvala; Christina L. Porter; Dennis F. Gardner; Michael Gerrity; Giulia F. Mancini; Xiaoshi Zhang; Galen P. Miley; Elisabeth R. Shanblatt; Benjamin R. Galloway; Charles S. Bevis; Robert Karl; Daniel A. Adams; Henry C. Kapteyn; Margaret M. Murnane
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Paper Abstract

EUV lithography is promising for addressing upcoming, <10nm nodes for the semiconductor industry, but with this promise comes the need for reliable metrology techniques. In particular, there is a need for actinic mask inspection in which the imaging wavelength matches that of the intended lithography process, so that the most relevant defects are detected. Here, we demonstrate tabletop, ptychographic, coherent diffraction imaging (CDI) in reflection- and transmission-modes of extended samples, using a 13 nm high harmonic generation (HHG) source. We achieve the first sub-wavelength resolution EUV image (0.9λ) in transmission, the highest spatial resolution using any 13.5 nm source to date. We also present the first reflection-mode image obtained on a tabletop using 12.7 nm light. This work represents the first 12.7 nm reflection-mode image using any source of a general sample.

Paper Details

Date Published: 28 March 2017
PDF: 8 pages
Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101450L (28 March 2017); doi: 10.1117/12.2271386
Show Author Affiliations
Michael Tanksalvala, Univ. of Colorado Boulder (United States)
Christina L. Porter, Univ. of Colorado Boulder (United States)
Dennis F. Gardner, Univ. of Colorado Boulder (United States)
Michael Gerrity, Univ. of Colorado Boulder (United States)
Giulia F. Mancini, Univ. of Colorado Boulder (United States)
Xiaoshi Zhang, Kapteyn-Murnane Labs., Inc. (United States)
Galen P. Miley, Northwestern Univ. (United States)
Elisabeth R. Shanblatt, Univ. of Colorado Boulder (United States)
Benjamin R. Galloway, Univ. of Colorado Boulder (United States)
Charles S. Bevis, Univ. of Colorado Boulder (United States)
Robert Karl, Univ. of Colorado Boulder (United States)
Daniel A. Adams, Univ. of Colorado Boulder (United States)
Henry C. Kapteyn, Univ. of Colorado Boulder (United States)
Kapteyn-Murnane Labs., Inc. (United States)
Margaret M. Murnane, Univ. of Colorado Boulder (United States)
Kapteyn-Murnane Labs., Inc. (United States)


Published in SPIE Proceedings Vol. 10145:
Metrology, Inspection, and Process Control for Microlithography XXXI
Martha I. Sanchez, Editor(s)

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