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Is there any dose-rate effect in breaking DNA strands by short pulses of extreme ultraviolet and soft x-ray radiation? (Conference Presentation)
Author(s): Ludek Vyšín; Tomáš Burian; Egor Ukraintsev; Marie Davídková; Libor Juha; Michael E. Grisham; Scott C. Heinbuch; Jorge J. Rocca

Paper Abstract

Possible dose-rate effects in a plasmid DNA exposed to pulsed extreme ultraviolet (XUV) and soft x-ray (SXR) water window radiation from two different table-top plasma-based sources was studied. Dose delivered to the target molecule was controlled by attenuating the incident photon flux with aluminum thin foils as well as varying the DNA/buffer-salt ratio in the irradiated sample. Irradiated samples were analyzed using the agarose gel electrophoresis. Some additional bands were identified in gel electrophoretograms as results of a DNA cross-linking. They were inspected by atomic force microscopy (AFM). Yields of single- and double-strand breaks (Gy-1 Da-1) were determined as a function of incident dose rate. Both yields decreased with a dose rate increasing. The ratio of single- and double-strand breaks exhibited only a slight increase at elevated dose rates. In conclusion, complex and/or clustered damages do not seem to be initiated under these irradiation conditions.

Paper Details

Date Published: 21 June 2017
PDF: 1 pages
Proc. SPIE 10236, Damage to VUV, EUV, and X-ray Optics VI, 102360C (21 June 2017); doi: 10.1117/12.2271171
Show Author Affiliations
Ludek Vyšín, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Tomáš Burian, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Egor Ukraintsev, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Marie Davídková, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Libor Juha, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Michael E. Grisham, Stable Laser Systems (United States)
Scott C. Heinbuch, Colorado State Univ. (United States)
Jorge J. Rocca, Colorado State Univ. (United States)


Published in SPIE Proceedings Vol. 10236:
Damage to VUV, EUV, and X-ray Optics VI
Libor Juha; Saša Bajt; Regina Soufli, Editor(s)

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