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Proceedings Paper

Electric field distribution on surface of the artificial magnetic conductor: miniaturization process
Author(s): Welyson T. S. Ramos; Renato C. Mesquita; Elson J. Silva
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Paper Abstract

This paper presents a study of the influence of the geometric shape on the resonance frequency of the artificial magnetic conductor (AMC) by analysis of the electric field distributions on top of the surface metallic patch inside the unit cell. It is known that various parameters such as geometry, dielectric substrate thickness, gap between patches, length and width of patch, size of unit cell, permittivity and permeability strongly affect the resonance frequency. In attempts to elucidate the miniaturization process, as reference, a metallic square patch with a unit cell of size 10 mm × 10 mm was simulated and a resonance frequency of 5.75 GHz was obtained. The device has illuminated by a plane wave with polarization in the y direction. Additionally, different geometries were performed such as triangle, hexagon, circle and cross of Jerusalem. We realized that the field distribution can be used as an physical insight to understand the AMC miniaturization process. In particular, bow-tie geometry provided considerable electrical miniaturization compared with square patch, about 1.5 GHz. The results are supported by finite element method. Our findings suggest that shift at resonant frequency may be interpreted as a variation in the net induced electric polarizability on the surface of the metallic patches.

Paper Details

Date Published: 24 August 2017
PDF: 6 pages
Proc. SPIE 10343, Metamaterials, Metadevices, and Metasystems 2017, 1034326 (24 August 2017); doi: 10.1117/12.2270832
Show Author Affiliations
Welyson T. S. Ramos, Univ. Federal de Minas Gerais (Brazil)
Renato C. Mesquita, Univ. Federal de Minas Gerais (Brazil)
Elson J. Silva, Univ. Federal de Minas Gerais (Brazil)


Published in SPIE Proceedings Vol. 10343:
Metamaterials, Metadevices, and Metasystems 2017
Nader Engheta; Mikhail A. Noginov; Nikolay I. Zheludev, Editor(s)

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