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Proceedings Paper

Reflective optics for effective collection of x-ray and EUV radiation: use for creation of photoionized plasmas and detection of weak signals
Author(s): A. Bartnik; W. Skrzeczanowski; P. Wachulak; I. Saber; H. Fiedorowicz; T. Fok; Ł. Węgrzyński
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Paper Abstract

In this work different kinds of reflective optical systems were used for creation and investigation of low temperature, photoionized plasmas. The plasmas were created in gases, irradiated with a focused beam of extreme ultraviolet (EUV) or soft X-ray (SXR) radiation, from laser-plasma sources employing 10 Hz Nd:YAG laser systems (0.8 J/ 4 ns and 10 J/ 1-10 ns). In both cases, the EUV radiation was focused using a gold-plated grazing incidence ellipsoidal collector in the wavelength range λ = 9÷70 nm or a gold-plated grazing incidence multifoil collector in the wavelength range λ = 5 ÷ 70 nm. Additionally, in case of the 10 J Nd:YAG laser with the pulse duration 1 ns, a paraboloidal collector optimized for the wavelength range λ ≥ 1 nm was employed. Different gases were injected into the vacuum chamber, perpendicularly to an optical axis of the irradiation system at the focal region, using an auxillary gas puff valve. Irradiation of the gases resulted in ionization and excitation of atoms/molecules. Spectra in SXR/EUV range were measured using a grazing incidence, flat-field spectrometer (McPherson Model 251), equipped with a 450 lines/mm toroidal grating or a home-made spectrograph based on the 5000 l/mm transmission grating. Optical spectra were recorded using the Echelle Spectra Analyzer ESA 4000. In all cases the most intense emission lines were assigned to singly charged ions, however, lines corresponding to ions with higher charge were also recorded. Based on spectral lines originating from ions electron temperature was estimated.

Paper Details

Date Published: 31 May 2017
PDF: 8 pages
Proc. SPIE 10235, EUV and X-ray Optics: Synergy between Laboratory and Space V, 102350D (31 May 2017); doi: 10.1117/12.2269438
Show Author Affiliations
A. Bartnik, Military Univ. of Technology (Poland)
W. Skrzeczanowski, Military Univ. of Technology (Poland)
P. Wachulak, Military Univ. of Technology (Poland)
I. Saber, Military Univ. of Technology (Poland)
H. Fiedorowicz, Military Univ. of Technology (Poland)
T. Fok, Military Univ. of Technology (Poland)
Ł. Węgrzyński, Military Univ. of Technology (Poland)


Published in SPIE Proceedings Vol. 10235:
EUV and X-ray Optics: Synergy between Laboratory and Space V
René Hudec; Ladislav Pina, Editor(s)

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