Share Email Print
cover

Proceedings Paper

Accumulative damage of ruthenium coated silicon exposed to multiple XUV pulses at 250 kHz-1 MHz repetition rate
Author(s): Ryszard Sobierajski; Igor A. Makhotkin; Igor Milov; Dorota Klinger; Ivanna Jacyna; Jaromir Chalupský; Vera Hájková; Enrico G. Keim; Henk A.G. M. van Wolferen; Mark Smithers; Tomáš Burian; Rilpho Donker; Hartmut Enkisch; Bart Faatz; Libor Juha; Marek Jurek; Robbert W. E. van de Kruijs; Eric Louis; Karel Saksl; Siegfried Schreiber; Frank Scholze; Frank Siewert; Kai Tiedke; Sven Toleikis; Gosse C. de Vries
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Details

Date Published:
PDF
Proc. SPIE 10236, Damage to VUV, EUV, and X-ray Optics VI, 1023604; doi: 10.1117/12.2269107
Show Author Affiliations
Ryszard Sobierajski, The Institute of Physics (Poland)
Igor A. Makhotkin, MESA+ Institute for Nanotechnology, Univ. Twente (Netherlands)
Igor Milov, MESA+ Institute for Nanotechnology, Univ. of Twente (Netherlands)
Dorota Klinger, The Institute of Physics (Poland)
Ivanna Jacyna, The Institute of Physics (Poland)
Jaromir Chalupský, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Vera Hájková, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Enrico G. Keim, MESA+ Institute for Nanotechnology, Univ. Twente (Netherlands)
Henk A.G. M. van Wolferen, MESA+ Institute for Nanotechnology, Univ. Twente (Netherlands)
Mark Smithers, MESA+ Institute for Nanotechnology, Univ. Twente (Netherlands)
Tomáš Burian, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Rilpho Donker, ASML Netherlands B.V. (Netherlands)
Hartmut Enkisch, Carl Zeiss SMT GmbH (Germany)
Bart Faatz, Deutsches Elektronen-Synchrotron (Germany)
Libor Juha, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Marek Jurek, The Institute of Physics (Poland)
Robbert W. E. van de Kruijs, MESA+ Institute for Nanotechnology, Univ. Twente (Netherlands)
Eric Louis, MESA+ Institute for Nanotechnology, Univ. of Twente (Netherlands)
Karel Saksl, Institute of Physics of the ASCR, v.v.i. (Czech Republic)
Institute of Materials Research SAS (Slovakia)
Siegfried Schreiber, Deutsches Elektronen-Synchrotron (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Frank Siewert, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
Kai Tiedke, Deutsches Elektronen-Synchrotron (Germany)
Sven Toleikis, Deutsches Elektronen-Synchrotron (Germany)
Gosse C. de Vries, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 10236:
Damage to VUV, EUV, and X-ray Optics VI
Libor Juha; Saša Bajt; Regina Soufli, Editor(s)

© SPIE. Terms of Use
Back to Top