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Proceedings Paper

High spatial resolution absorption contrast imaging with electron-beam excitation assisted optical microscope
Author(s): Wataru Inami; Masahiro Fukuta; Yoshimasa Kawata; Susumu Terakawa
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Paper Abstract

We present high spatial-resolution label-free imaging with an electron-beam excitation-assisted optical microscope (EXA microscope). The EXA microscope improves the spatial resolution down to 100 nm. To realize the high spatial resolution, a nanoscale optical spot is generated by irradiating a fluorescent thin film with a focused electron beam whose spot size is less than 10 nm. The size of the optical spot becomes smaller than the diffraction limited spot size and is reduced to about 100 nm, because the light emission is localized in nanometer-sized region. In this microscopy, it is not necessary to label a specimen for imaging beyond the diffraction limit of the light. The specimen stage is separated from the vacuum chamber of the scanning electron microscope by the fluorescent thin film and a specimen under atmospheric pressure can be imaged.

We demonstrated that the high spatial resolution absorption contrast imaging of the crystal of vitamin B9 having absorption at UV wavelengths. The absorption wavelength matches with the wavelength of the emission of the fluorescent thin film we deposited. The fine crystal structure was imaged beyond the optical diffraction limit. The image contrast corresponded with the thickness of the crystal measured with an atomic force microscope (AFM). The illumination light is absorbed with the vitamin B9 crystal and the intensity of the transmitted light depends on the thickness of the vitamin B9 crystal. The EXA microscope is useful for analysis of growth of a crystal, bio-imaging, and so on.

Paper Details

Date Published: 14 December 2016
PDF: 6 pages
Proc. SPIE 10176, Asia-Pacific Conference on Fundamental Problems of Opto- and Microelectronics, 1017617 (14 December 2016); doi: 10.1117/12.2268277
Show Author Affiliations
Wataru Inami, Shizuoka Univ. (Japan)
Masahiro Fukuta, Shizuoka Univ. (Japan)
Yoshimasa Kawata, Shizuoka Univ. (Japan)
Susumu Terakawa, Tokoha Univ. (Japan)


Published in SPIE Proceedings Vol. 10176:
Asia-Pacific Conference on Fundamental Problems of Opto- and Microelectronics
Yuri N. Kulchin; Roman V. Romashko; Alexander V. Syuy, Editor(s)

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