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Effect of oxygen flux on stress and optical properties of Ta-2 O-5 using ion-beam sputtering
Author(s): Qi Yu; Jun-qi Fan; Chun-lin Guan
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Paper Abstract

The ion-beam sputtering deposition is a good technique for making low scattering coatings. In this work, the Ta2O5 thin films as the oxygen flux (15-35sccm) were prepared on the K9 glass using the single ion-beam sputtering. As the oxygen flux increased, the thickness of films with the same deposited time decreased from 936.67nm to 837.87nm. The refractive index was 2.075 in 1000nm at 30 sccm. The stress increased along with the increasing of oxygen flux. In the work, the compressive stress increased from 319.55 Mpa to 410.92 Mpa.

Paper Details

Date Published: 8 March 2017
PDF: 5 pages
Proc. SPIE 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 102551E (8 March 2017); doi: 10.1117/12.2267493
Show Author Affiliations
Qi Yu, The Key Lab. of Adaptive Optics (China)
Institute of Optics and Electronics (China)
Univ. of Chinese Academy of Science (China)
Jun-qi Fan, The Key Lab. of Adaptive Optics (China)
Institute of Optics and Electronics (China)
Chun-lin Guan, The Key Lab. of Adaptive Optics (China)
Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 10255:
Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016
Yueguang Lv; Jialing Le; Hesheng Chen; Jianyu Wang; Jianda Shao, Editor(s)

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