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Proceedings Paper

Preparation and damage characteristics of broad bandwidth HR films for picoseconds laser system
Author(s): Guoyun Long; Yaoping Zhang; Junqi Fan
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Paper Abstract

High reflection films for 800nm picoseconds laser system requires broad bandwidth, which is usually about ±50nm, or even to ±70nm, and a high laser damage threshold is needed at the same time. Multilayer dielectrics using three materials Nb2O5/SiO2-HfO2/SiO2 were fabricated by electron beam evaporation. Benefit from its high refractive index of Nb2O5 and the high damage threshold of HfO2 films, the multilayer dielectrics were prepared successfully, which have more than 99.5% reflectance within bandwidth larger than 140nm around the center wavelength of 800 nm. The laser damage characteristics of the films at 150ps, 1Hz were studied, and the damage mechanism was analyzed.

Paper Details

Date Published: 8 March 2017
PDF: 6 pages
Proc. SPIE 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 102551B (8 March 2017); doi: 10.1117/12.2267391
Show Author Affiliations
Guoyun Long, Institute of Optics and Electronics (China)
Yaoping Zhang, Institute of Optics and Electronics (China)
Junqi Fan, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 10255:
Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016
Yueguang Lv; Jialing Le; Hesheng Chen; Jianyu Wang; Jianda Shao, Editor(s)

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