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Proceedings Paper

Effect of substrate thickness on properties of protective antireflection a-C:H films deposited by PECVD
Author(s): Kaihu Fu; Chengkui Zu; Yangli Jin; Yang Qiu; Bin Han
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Paper Abstract

The a-C:H films were deposited on glasses with different substrate thickness (rising from 2mm to 26mm) by Plasma Enhanced Chemical Vapor Deposition (PECVD). The effect of substrate thickness to the deposition rate, structural variations of films was investigated by surface morphology device and Raman spectroscopy. The results show that the deposition rate, H contents of films increase, meanwhile, I(D)/I(G), G peak position decrease and all of them show strong linear relation with the increasing substrate thickness. The a-C:H film with the highest thickness presents the highest deposition rate (37.7nm/s), nanohardness (20.2GPa), elastic modulus (118.8GPa) and lowest friction coefficient (0.266).

Paper Details

Date Published: 8 March 2017
PDF: 22 pages
Proc. SPIE 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 1025517 (8 March 2017); doi: 10.1117/12.2266916
Show Author Affiliations
Kaihu Fu, China Building Materials Academy (China)
Chengkui Zu, China Building Materials Academy (China)
Yangli Jin, China Building Materials Academy (China)
Yang Qiu, China Building Materials Academy (China)
Bin Han, China Building Materials Academy (China)


Published in SPIE Proceedings Vol. 10255:
Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016
Yueguang Lv; Jialing Le; Hesheng Chen; Jianyu Wang; Jianda Shao, Editor(s)

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