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Proceedings Paper

Study of the thermal damage mechanism in the discharge of high power xenon lamp
Author(s): Xiangchao Guo; Jianjun Liu; Haibing Li; Ruihua Wu; Ruoyan Shao; Hairong Liang; Wenzheng Lin
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Paper Abstract

With method of fixing wire in the high power pulsed xenon lamp tube, an experimental device of double lamp series was established to simulate the actual working environment of the xenon lamp. The experimental results show that the thermal damage with the pre delay time of 150μs is much more serious compared with the pre delay time of 250μs. The reason could be that the metastable particles formed by pre discharge are uneven with the former. The tube pale first appears near the left lamp anode and the right lamp cathode. The possible reason is that bifurcates and shifts of the plasma discharge channel are affected by the wire. The test results show that the main reason of thermal damage is that the temperature of discharge plasma is uneven inside the tube. By improving the structure of the lamp box and optimizing the pre delay time, the discharge plasma temperature can be decreased for the avoidance of the thermal damage.

Paper Details

Date Published: 8 March 2017
PDF: 5 pages
Proc. SPIE 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 1025513 (8 March 2017); doi: 10.1117/12.2266480
Show Author Affiliations
Xiangchao Guo, Shanghai Institute of Optics and Fine Mechanics (China)
Jianjun Liu, Shanghai Institute of Optics and Fine Mechanics (China)
Haibing Li, Shanghai Institute of Optics and Fine Mechanics (China)
Ruihua Wu, Shanghai Institute of Optics and Fine Mechanics (China)
Ruoyan Shao, Shanghai Institute of Optics and Fine Mechanics (China)
Hairong Liang, Shanghai Institute of Optics and Fine Mechanics (China)
Wenzheng Lin, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 10255:
Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016
Yueguang Lv; Jialing Le; Hesheng Chen; Jianyu Wang; Jianda Shao, Editor(s)

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