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Proceedings Paper

Photoresponse in graphene field effect transistor under ultra-short pulsed laser irradiation
Author(s): Aleksei V. Emelianov; Dmitry M. Kireev; Nerea Otero; Pablo Romero; Ivan I. Bobrinetskiy
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Paper Abstract

We have developed the ultra-short pulsed laser processing methods for patterning of graphene field effect transistors in topological and chemical way. We investigated in details the photoresponse in graphene FETs before and after laser-induced modification for laser influence below threshold energy. We observed two different mechanisms of the photoresponse under ultra-short laser pulses (280 fs). The photocurrent, observed for both pristine and laser processed graphene is raised because the laser induced charge is transferred from graphene to trapped levels in SiO2 surface resulting in electrostatic Dirac point shift. For laser oxidized areas we observed more pronounced photocurrent because of heterojunction formation in laser-processed area. While for electrostatic effect the relaxation time estimated as 50 seconds, the heterojunction relaxation was observed for less than 3 ms.

Paper Details

Date Published: 30 December 2016
PDF: 5 pages
Proc. SPIE 10224, International Conference on Micro- and Nano-Electronics 2016, 102240P (30 December 2016); doi: 10.1117/12.2266470
Show Author Affiliations
Aleksei V. Emelianov, National Research Univ. of Electronic Technology (Russian Federation)
Dmitry M. Kireev, Forschungszentrum Jülich GmbH (Germany)
Nerea Otero, AIMEN - Asociación de Investigación Metalúrgica del Noroeste (Spain)
Pablo Romero, AIMEN - Asociación de Investigación Metalúrgica del Noroeste (Spain)
Ivan I. Bobrinetskiy, National Research Univ. of Electronic Technology (Russian Federation)


Published in SPIE Proceedings Vol. 10224:
International Conference on Micro- and Nano-Electronics 2016
Vladimir F. Lukichev; Konstantin V. Rudenko, Editor(s)

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