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Proceedings Paper

CMOS compatible thermal tunable planar silicon etched diffraction gratings
Author(s): Jun Li; Chao Qiu; Xin Chen; Zhen Sheng; Aimin Wu; Fuwan Gan
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Paper Abstract

A five-channel silicon etched diffraction gratings (EDGs) working in the O-band was demonstrated in this paper. The device has a channel spacing of 20 nm and occupies a footprint of 180μm×120μm with an insertion loss of 5.3dB. Integrated heaters were designed to compensate the center wavelength shifts brought from fabrication errors. A tuning efficiency of 0.358nm/mA was obtained finally.

Paper Details

Date Published: 5 January 2017
PDF: 4 pages
Proc. SPIE 10244, International Conference on Optoelectronics and Microelectronics Technology and Application, 1024429 (5 January 2017); doi: 10.1117/12.2266336
Show Author Affiliations
Jun Li, Shanghai Univ. (China)
Shanghai Institute of Microsystem and Information Technology (China)
Chao Qiu, SIMIT Nantong Optoelectronic Engineering Ctr. (China)
Xin Chen, Shanghai Institute of Microsystem and Information Technology (China)
Zhen Sheng, Shanghai Institute of Microsystem and Information Technology (China)
Aimin Wu, Shanghai Institute of Microsystem and Information Technology (China)
Fuwan Gan, Shanghai Institute of Microsystem and Information Technology (China)


Published in SPIE Proceedings Vol. 10244:
International Conference on Optoelectronics and Microelectronics Technology and Application
Shaohua Yu; Jose Capmany; Yi Luo; Yikai Su; Songlin Zhuang; Yue Hao; Akihiko Yoshikawa; Chongjin Xie; Yoshiaki Nakano, Editor(s)

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