Share Email Print
cover

Proceedings Paper • Open Access • new

Displacement Talbot lithography: an alternative technique to fabricate nanostructured metamaterials
Author(s): E. D. Le Boulbar; P. J. P. Chausse; S. Lis; P. A. Shields

Paper Abstract

Nanostructured materials are essential for many recent electronic, magnetic and optical devices. Lithography is the most common step used to fabricate organized and well calibrated nanostructures. However, feature sizes less than 200 nm usually require access to deep ultraviolet photolithography, e-beam lithography or soft lithography (nanoimprinting), which are either expensive, have low-throughput or are sensitive to defects. Low-cost, high-throughput and low-defect-density techniques are therefore of interest for the fabrication of nanostructures. In this study, we investigate the potential of displacement Talbot lithography for the fabrication of specific structures of interest within plasmonic and metamaterial research fields. We demonstrate that nanodash arrays and ‘fishnet’-like structures can be fabricated by using a double exposure of two different linear grating phase masks. Feature sizes can be tuned by varying the exposure doses. Such lithography has been used to fabricate metallic ‘fishnet’-like structures using a lift-off technique. This proof of principle paves the way to a low-cost, high-throughput, defect-free and large-scale technique for the fabrication of structures that could be useful for metamaterial and plasmonic metasurfaces. With the development of deep ultraviolet displacement Talbot lithography, the feature dimensions could be pushed lower and used for the fabrication of optical metamaterials in the visible range.

Paper Details

Date Published: 8 June 2017
PDF: 10 pages
Proc. SPIE 10248, Nanotechnology VIII, 102480Q (8 June 2017); doi: 10.1117/12.2265774
Show Author Affiliations
E. D. Le Boulbar, Univ. of Bath (United Kingdom)
P. J. P. Chausse, Univ. of Bath (United Kingdom)
S. Lis, Univ. of Bath (United Kingdom)
P. A. Shields, Univ. of Bath (United Kingdom)


Published in SPIE Proceedings Vol. 10248:
Nanotechnology VIII
Ion M. Tiginyanu, Editor(s)

© SPIE. Terms of Use
Back to Top