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Proceedings Paper

Progress in EUV lithography toward manufacturing
Author(s): Seong-Sue Kim; Roman Chalykh; Hoyeon Kim; Seungkoo Lee; Changmin Park; Myungsoo Hwang; Joo-On Park; Jinhong Park; Hocheol Kim; Jinho Jeon; Insung Kim; Donggun Lee; Jihoon Na; Jungyeop Kim; Siyong Lee; Hyunwoo Kim; Seok-Woo Nam
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Paper Abstract

In this article the recent progress in the elements of EUV lithography is presented. Source power around 205W was demonstrated and further scaling up is going on, which is expected to be implemented in the field within 2017. Source availability keeps improving especially due to the introduction of new droplet generator but collector lifetime needs to be verified at each power level. Mask blank defect satisfied the HVM goal. Resist meets the requirements of development purposes and dose needs to be reduced further to satisfy the productivity demand. Pellicle, where both the high transmittance and long lifetime are demanded, needs improvements especially in pellicle membrane. Potential issues in high-NA EUV are discussed including resist, small DOF, stitching, mask infrastructure, whose solutions need to be prepared timely in addition to high-NA exposure tool to enable this technology.

Paper Details

Date Published: 24 March 2017
PDF: 10 pages
Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 1014306 (24 March 2017); doi: 10.1117/12.2264043
Show Author Affiliations
Seong-Sue Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Roman Chalykh, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hoyeon Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seungkoo Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Changmin Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Myungsoo Hwang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Joo-On Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jinhong Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hocheol Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jinho Jeon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Insung Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Donggun Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jihoon Na, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jungyeop Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Siyong Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hyunwoo Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seok-Woo Nam, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 10143:
Extreme Ultraviolet (EUV) Lithography VIII
Eric M. Panning, Editor(s)

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