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Proceedings Paper

Design of diffractive optical elements for optical interconnections
Author(s): Weidong Qu; Qiong Gao; Yanxiu Zhang; Bing Wang; Na Ma; Juanfeng Wang; Ping Lei; Zhendong Ding; Bing Bai
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Paper Abstract

Diffractive optical elements (DOEs) can realize beam shaping with higher light efficiency, strong flexibility of diffraction pattern, and is suitable to be used in optical interconnections to split beams. In order to increase the intensity uniformity of the split beams, a hybrid algorithm merging Gerchberg-Saxton (GS) algorithm with gradient method is presented based on the sampling rule different from the existing optimization algorithms. By controlling N extra points with zero amplitude besides the original N sampling points on the input plane, and finally the sampling pitch on the Fourier plane is half of that of the conventional sampling rule. Then the N extra points on the Fourier plane will be controlled. Finally spot array with high intensity uniformity can be realized with the proposed algorithm. Simulation results demonstrate the good performance of the proposed algorithm.

Paper Details

Date Published: 5 January 2017
PDF: 4 pages
Proc. SPIE 10244, International Conference on Optoelectronics and Microelectronics Technology and Application, 1024405 (5 January 2017); doi: 10.1117/12.2263940
Show Author Affiliations
Weidong Qu, Luoyang Electronic Equipment Test Ctr. (China)
Qiong Gao, Luoyang Electronic Equipment Test Ctr. (China)
Yanxiu Zhang, Luoyang Electronic Equipment Test Ctr. (China)
Bing Wang, Luoyang Electronic Equipment Test Ctr. (China)
Na Ma, Luoyang Electronic Equipment Test Ctr. (China)
Juanfeng Wang, Luoyang Electronic Equipment Test Ctr. (China)
Ping Lei, Luoyang Electronic Equipment Test Ctr. (China)
Zhendong Ding, Luoyang Electronic Equipment Test Ctr. (China)
Bing Bai, Luoyang Electronic Equipment Test Ctr. (China)


Published in SPIE Proceedings Vol. 10244:
International Conference on Optoelectronics and Microelectronics Technology and Application
Shaohua Yu; Jose Capmany; Yi Luo; Yikai Su; Songlin Zhuang; Yue Hao; Akihiko Yoshikawa; Chongjin Xie; Yoshiaki Nakano, Editor(s)

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