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Large area precision optical coatings by pulse magnetron sputtering
Author(s): Peter Frach; Daniel Gloess; Thomas Goschurny; Andy Drescher; Ullrich Hartung; Hagen Bartzsch; Andreas Heisig; Harald Grune; Lothar Leischnig; Steffen Leischnig; Carsten Bundesmann
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Paper Abstract

Pulse magnetron sputtering is very well suited for the deposition of optical coatings. Due to energetic activation during film growth, sputtered films are dense, smooth and show an excellent environmental stability. Films of materials like SiO2, Al2O3, Nb2O5 or Ta2O5 can be produced with very little absorption and scattering losses and are well suited for precision optics. FEP's coating plant PreSensLine, a deposition machine dedicated for the development and deposition of precision optical layer systems will be presented. The coating machine (VON ARDENNE) is equipped with dual magnetron systems (type RM by FEP). Concepts regarding machine design, process technology and process control as well as in situ monitoring are presented to realize the high demands on uniformity, accuracy and reproducibility. Results of gradient and multilayer type precision optical coatings are presented. Application examples are edge filters and special antireflective coatings for the backlight of 3D displays with substrate size up to 300 x 400mm. The machine allows deposition of rugate type gradient layers by rotating a rotary table with substrates between two sources of the dual magnetron system. By combination of the precision drive (by LSA) for the substrate movement and a special pulse parameter variation during the deposition process (available with the pulse unit UBS-C2 of FEP), it is possible to adjust the deposition rate as a function of the substrate position exactly. The aim of a current development is a technology for the uniform coating of 3D-substrates and freeform components as well as laterally graded layers.

Paper Details

Date Published: 11 May 2017
PDF: 7 pages
Proc. SPIE 10181, Advanced Optics for Defense Applications: UV through LWIR II, 101810K (11 May 2017); doi: 10.1117/12.2262541
Show Author Affiliations
Peter Frach, Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl-und Plasmatechnik FEP (Germany)
Daniel Gloess, Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl-und Plasmatechnik FEP (Germany)
Thomas Goschurny, Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl-und Plasmatechnik FEP (Germany)
Andy Drescher, Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl-und Plasmatechnik FEP (Germany)
Ullrich Hartung, Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl-und Plasmatechnik FEP (Germany)
Hagen Bartzsch, Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl-und Plasmatechnik FEP (Germany)
Andreas Heisig, Von Ardenne Anlagentechnik GmbH (Germany)
Harald Grune, Von Ardenne Anlagentechnik GmbH (Germany)
Lothar Leischnig, LSA GmbH (Germany)
Steffen Leischnig, LSA GmbH (Germany)
Carsten Bundesmann, Leibniz-Institut für Oberflächenmodifizierung e.V. (Germany)


Published in SPIE Proceedings Vol. 10181:
Advanced Optics for Defense Applications: UV through LWIR II
Jay N. Vizgaitis; Bjørn F. Andresen; Peter L. Marasco; Jasbinder S. Sanghera; Miguel P. Snyder, Editor(s)

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