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Proceedings Paper

Thermal degradation of InGaN/GaN quantum wells in blue laser diode structure during the epitaxial growth
Author(s): Kun Zhou; Massao Ikeda; Jianping Liu; Zengcheng Li; Yi Ma; Songxin Gao; Huaijin Ren; Chun Tang; Yi Sun; Qian Sun; Hui Yang
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Paper Abstract

True blue nitride laser diodes (LDs) are one of the key challenges for epitaxy of nitrides due to the variety of its potential applications. The growth of high temperature p-type layers may cause thermal degradation of the InGaN-based multiple quantum wells (MQWs) active region because of the annealing effect, since thick p-AlGaN layers were introduced as upper optical cladding layer in the LDs. The degradation was found in blue LDs grown on both Si and sapphire substrate. In the degraded LD wafer samples, “Dark” non-radiative MQWs regions were observed by microscopic photoluminescence. Formation of metallic indium precipitates and voids in these regions were confirmed by transmission electron microscope. The thermal degradation is attributed to the decomposition of indium-rich InGaN materials in the MQWs. The indium-rich InGaN materials were supposed to be accumulated at dislocation related V-shaped pits according to the surface morphology by atomic force microscope. To obtain high quality InGaN-based MQWs, one of the four methods can be introduced to eliminate the degradation. A lower thermal budget can suppress the decomposition of indium-rich InGaN clusters by a lower p-cladding layer growth temperature. The use of low threading dislocation density substrates results in low density indium-rich InGaN clusters. The introducing of H2 carrier gas during the quantum barriers growth or a 2-step growth scheme with a higher quantum barrier growth temperature etches off the indium-rich InGaN clusters. The suppression of the thermal degradation in the MQWs makes it possible for lasing of blue laser diode directly grown on Si.

Paper Details

Date Published: 5 January 2017
PDF: 7 pages
Proc. SPIE 10244, International Conference on Optoelectronics and Microelectronics Technology and Application, 102441X (5 January 2017); doi: 10.1117/12.2261665
Show Author Affiliations
Kun Zhou, China Academy of Engineering Physics (China)
Massao Ikeda, Suzhou Institute of Nano-Tech and Nano-Bionics (China)
Jianping Liu, Suzhou Institute of Nano-Tech and Nano-Bionics (China)
Zengcheng Li, Suzhou Institute of Nano-Tech and Nano-Bionics (China)
Yi Ma, China Academy of Engineering Physics (China)
Songxin Gao, China Academy of Engineering Physics (China)
Huaijin Ren, China Academy of Engineering Physics (China)
Chun Tang, China Academy of Engineering Physics (China)
Yi Sun, Suzhou Institute of Nano-Tech and Nano-Bionics (China)
Qian Sun, Suzhou Institute of Nano-Tech and Nano-Bionics (China)
Hui Yang, Suzhou Institute of Nano-Tech and Nano-Bionics (China)


Published in SPIE Proceedings Vol. 10244:
International Conference on Optoelectronics and Microelectronics Technology and Application
Shaohua Yu; Jose Capmany; Yi Luo; Yikai Su; Songlin Zhuang; Yue Hao; Akihiko Yoshikawa; Chongjin Xie; Yoshiaki Nakano, Editor(s)

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