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Proceedings Paper • Open Access

Development of 250W EUV light source for HVM lithography
Author(s): Hakaru Mizoguchi; Hiroaki Nakarai; Tamotsu Abe; Krzysztof M. Nowak; Yasufumi Kawasuji,; Hiroshi Tanaka; Yukio Watanabe; Tsukasa Hori; Takeshi Kodama; Yutaka Shiraishi; Tatsuya Yanagida; Tsuyoshi Yamada; Taku Yamazaki; Shinji Okazaki; Takashi Saitou

Paper Abstract

We have been developing CO2-Sn-LPP EUV light source which is the most promising solution as the 13.5nm high power light source for HVM EUVL since 2003. Unique original technologies such as; combination of pulsed CO2 laser and Sn droplets, dual wavelength laser pulse shooting and mitigation with magnetic field have been developed in Gigaphoton Inc.. The theoretical and experimental data have clearly showed the advantage of our proposed strategy. We demonstrated 117W EUV power (I/F clean in burst), 50 kHz, 22 hours stable operation at Pilot #1 device. Target of this device is 250 W EUV power by 27 kW pulsed CO2 driver laser system.

Paper Details

Date Published: 22 February 2017
PDF: 7 pages
Proc. SPIE 10097, High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VI, 1009702 (22 February 2017); doi: 10.1117/12.2261075
Show Author Affiliations
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)
Hiroaki Nakarai, Gigaphoton Inc. (Japan)
Tamotsu Abe, Gigaphoton Inc. (Japan)
Krzysztof M. Nowak, Gigaphoton Inc. (Japan)
Yasufumi Kawasuji,, Gigaphoton Inc. (Japan)
Hiroshi Tanaka, Gigaphoton Inc. (Japan)
Yukio Watanabe, Gigaphoton Inc. (Japan)
Tsukasa Hori, Gigaphoton Inc. (Japan)
Takeshi Kodama, Gigaphoton Inc. (Japan)
Yutaka Shiraishi, Gigaphoton Inc. (Japan)
Tatsuya Yanagida, Gigaphoton Inc. (Japan)
Tsuyoshi Yamada, Gigaphoton Inc. (Japan)
Taku Yamazaki, Gigaphoton Inc. (Japan)
Shinji Okazaki, Gigaphoton Inc. (Japan)
Takashi Saitou, Gigaphoton Inc. (Japan)


Published in SPIE Proceedings Vol. 10097:
High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VI
Stefan Kaierle; Stefan W. Heinemann, Editor(s)

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