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Proceedings Paper

Plasma etching of large-size silicon based microchannel plates
Author(s): Huan Liu; Linlin Fan; Yaojin Cheng; Shanshan Wang
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Paper Abstract

Microchannel plates (MCPs) are two-dimensional arrays of microscopic channel electron multipliers as the key component of the image intensifier. In this paper, the plasma etching process of large-size microchannel plates based on silicon is developed. Firstly, the etching of micro groove structure is researched for measure easily. The influences of the process parameters on the etching rate and sidewall verticality, such as oxygen flow, the pressure and the inductively coupled plasma (ICP) power, are studied. The results show the etching rate becomes larger and larger with the increasing of the pressure and ICP power. And the oxygen flow contributes to etching. But the sidewall verticality is worse with increasing oxygen flow. Though parameter experiment, the optimized parameter is got: the pressure 10mTorr, the ICP power 600W, the oxygen flow 6sccm. Using this parameter to etch micro-channel array, the microchannel array of largescale is got with pore 10μm, pitch 5μm, aspect ratio 20:1.

Paper Details

Date Published: 28 February 2017
PDF: 6 pages
Proc. SPIE 10256, Second International Conference on Photonics and Optical Engineering, 1025659 (28 February 2017); doi: 10.1117/12.2261067
Show Author Affiliations
Huan Liu, Science and Technology on Low-Light-Level Night Vision Lab. (China)
Xi'an Technological Univ. (China)
Linlin Fan, Xi'an Institute of Applied Optics (China)
Yaojin Cheng, Science and Technology on Low-Light-Level Night Vision Lab. (China)
Shanshan Wang, Xi'an Technological Univ. (China)


Published in SPIE Proceedings Vol. 10256:
Second International Conference on Photonics and Optical Engineering
Chunmin Zhang; Anand Asundi, Editor(s)

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