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Proceedings Paper

Enhanced OPC recipe coverage and early hotspot detection through automated layout generation and analysis
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Paper Abstract

State-of-the-art OPC recipes for production semiconductor manufacturing are fine-tuned, often artfully crafted parameter sets are designed to achieve design fidelity and maximum process window across the enormous variety of patterns in a given design level. In the typical technology lifecycle, the process for creating a recipe is iterative. In the initial stages, very little to no “real” design content is available for testing. Therefore, an engineer may start with the recipe from a previous node; adjust it based on known ground rules and a few test patterns and/or scaled designs, and then refine it based on hardware results. As the technology matures, more design content becomes available to refine the recipe, but it becomes more difficult to make major changes without significantly impacting the overall technology scope and schedule. The dearth of early design information is a major risk factor: unforeseen patterning difficulties (e.g. due to holes in design rules) are costly when caught late.

To mitigate this risk, we propose an automated flow that is capable of producing large-scale realistic design content, and then optimizing the OPC recipe parameters to maximize the process window for this layout. The flow was tested with a triple-patterned 10nm node 1X metal level. First, design-rule clean layouts were produced with a tool called Layout Schema Generator (LSG). Next, the OPC recipe was optimized on these layouts, with a resulting reduction in the number of hotspots. For experimental validation, the layouts were placed on a test mask, and the predicted hotspots were compared with hardware data.

Paper Details

Date Published: 24 March 2017
PDF: 9 pages
Proc. SPIE 10147, Optical Microlithography XXX, 101470R (24 March 2017); doi: 10.1117/12.2260769
Show Author Affiliations
Ayman Hamouda, GLOBALFOUNDRIES Inc. (United States)
Mohamed Bahnas, Mentor Graphics Corp. (United States)
Dan Schumacher, Mentor Graphics Corp. (United States)
Ioana Graur, GLOBALFOUNDRIES Inc. (United States)
Ao Chen, GLOBALFOUNDRIES Singapore (Singapore)
Kareem Madkour, Mentor Graphics Egypt (Egypt)
Hussein Ali, Mentor Graphics Egypt (Egypt)
Jason Meiring, Mentor Graphics Corp. (United States)
Neal Lafferty, Mentor Graphics Corp. (United States)
Chris McGinty, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 10147:
Optical Microlithography XXX
Andreas Erdmann; Jongwook Kye, Editor(s)

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