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Proceedings Paper

CD-SEM distortion quantification for EPE metrology and contour analysis
Author(s): Harm Dillen; Ton Kiers; Sandip Halder; Thomas I. Wallow; Frieda van Roey
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Paper Abstract

Given the potential impact of distortions within the Field Of View (FOV) of the SEM, we need a method to quantify and describe them. We will show a method to find the magnitude and directions of the distortions. This description will enable assessment of impact on local distance measurements like edge placement errors (EPE) analysis and contour measurements. Knowing the distortions with sufficient resolution and stability can also enable corrections for this phenomenon. We will show that applying this correction in post processing, we can bring back the absolute measurement error from 1.5 nm to 0.3 nm.

Paper Details

Date Published: 28 March 2017
PDF: 12 pages
Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 1014515 (28 March 2017); doi: 10.1117/12.2260664
Show Author Affiliations
Harm Dillen, ASML Netherlands B.V. (Netherlands)
Ton Kiers, ASML Netherlands B.V. (Netherlands)
Sandip Halder, IMEC (Belgium)
Thomas I. Wallow, ASML Brion (United States)
Frieda van Roey, IMEC (Belgium)


Published in SPIE Proceedings Vol. 10145:
Metrology, Inspection, and Process Control for Microlithography XXXI
Martha I. Sanchez, Editor(s)

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