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Proceedings Paper

High throughput and dense sampling metrology for process control
Author(s): Lei Sun; Tsunehito Kohyama; Kuniaki Takeda; Hiroto Nozawa; Yuji Asakawa; Taher Kagalwala; Granger Lobb; Frank Mont; Xintuo Dai; Shyam Pal; Wenhui Wang; Jongwook Kye; Francis Goodwin
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Paper Abstract

Optical metrology tool, LX530, is designed for high throughput and dense sampling metrology in semiconductor manufacture. It can inspect the dose and focus variation in the process control based on the critical dimension (CD) and line edge roughness (LER) measurement. The working principle is shown with a finite-difference-time-domain (FDTD) CD simulation. Two optical post lithography wafers, including one focus-exposure-matrix (FEM) wafer and one nominal wafer, are inspected for CD, dose and focus analysis. It is demonstrated that dose and focus can be measured independently. A data output method based on global CD uniformity (CDU), inter CDU and intra CDU is proposed to avoid the data volume issue in dense sampling whole wafer inspection.

Paper Details

Date Published: 28 March 2017
PDF: 8 pages
Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101452D (28 March 2017); doi: 10.1117/12.2258623
Show Author Affiliations
Lei Sun, GLOBALFOUNDRIES Inc. (United States)
Tsunehito Kohyama, Lasertec Corp. (Japan)
Kuniaki Takeda, Lasertec Corp. (Japan)
Hiroto Nozawa, Lasertec Corp. (Japan)
Yuji Asakawa, Lasertec USA Inc. (United States)
Taher Kagalwala, GLOBALFOUNDRIES Inc. (United States)
Granger Lobb, GLOBALFOUNDRIES Inc. (United States)
Frank Mont, GLOBALFOUNDRIES Inc. (United States)
Xintuo Dai, GLOBALFOUNDRIES Inc. (United States)
Shyam Pal, GLOBALFOUNDRIES Inc. (United States)
Wenhui Wang, GLOBALFOUNDRIES Inc. (United States)
Jongwook Kye, GLOBALFOUNDRIES Inc. (United States)
Francis Goodwin, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 10145:
Metrology, Inspection, and Process Control for Microlithography XXXI
Martha I. Sanchez, Editor(s)

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