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Proceedings Paper

Reduction and control of intrafield focus variation on 7nm technology
Author(s): Jennifer Shumway; Nathan Neal; Sheldon Meyers; Jens Reichelt; Young Ki Kim; Justin Hanson; Ferhad Kamalizadeh; Dionysios Petromanolakis; Youri van Dommelen; Robert Bonanni; Arjan Gijsbertsen
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Paper Abstract

With each technology node, overall focus budgets have become increasingly tighter in order to meet the necessary product requirements. The 7nm node has required us to define new opportunities for addressing top contributors to the focus budget. Field curvature in particular has been identified as a key contributor to the intrafield focus budget, contributing around 50%. This paper will introduce two new methodologies for improving field curvature; one a hardware solution and one a software solution.

Paper Details

Date Published: 22 January 2018
PDF: 5 pages
Proc. SPIE 10147, Optical Microlithography XXX, 101470B (22 January 2018); doi: 10.1117/12.2258391
Show Author Affiliations
Jennifer Shumway, GLOBALFOUNDRIES Inc. (United States)
Nathan Neal, GLOBALFOUNDRIES Inc. (United States)
Sheldon Meyers, GLOBALFOUNDRIES Inc. (United States)
Jens Reichelt, GLOBALFOUNDRIES Inc. (United States)
Young Ki Kim, GLOBALFOUNDRIES Inc. (United States)
Justin Hanson, ASML (United States)
Ferhad Kamalizadeh, ASML (United States)
Dionysios Petromanolakis, ASML (United States)
Youri van Dommelen, ASML (United States)
Robert Bonanni, ASML (United States)
Arjan Gijsbertsen, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 10147:
Optical Microlithography XXX
Andreas Erdmann; Jongwook Kye, Editor(s)

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