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Proceedings Paper

Development of mass production technology for block copolymer lithographic materials
Author(s): Toshiyuki Himi; Ryota Matsuki; Terumasa Kosaka; Ryosuke Ogaki; Yukio Kawaguchi; Tetsuo Shimizu
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Paper Abstract

We have successfully synthesized various and over wide range molecular weight block copolymers (BCPs): these are polystyrene(PS)-polymethylmethacrylate(PMMA) as general components and poly(4-trimethylsilylstyrene)(PTMSS)- poly(4-hydroxystyrene)(PHS) system as very strong segregated components (high chi) and multiblock type of those copolymers which form the microphase-separated structure pattern using living anionic polymerizing method by which the size of polymer can be precisely controlled. In addition, we were able to observe alternating lamellar and cylinder structures which were formed by our various BCPs using small angle X-ray scattering (SAXS). Moreover, we have successfully developed new apparatus for high volume manufacturing including our original technologies such as purification of monomer, improvement of wetted surface, and mechanical technology for high vacuum. And we have successfully synthesized all the BCPs with narrow molecular weight distribution (PDI <1.1) with large-scale apparatus.

Paper Details

Date Published: 27 March 2017
PDF: 6 pages
Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101461Z (27 March 2017); doi: 10.1117/12.2258167
Show Author Affiliations
Toshiyuki Himi, HORIBA STEC, Co., Ltd. (Japan)
Ryota Matsuki, HORIBA STEC, Co., Ltd. (Japan)
Terumasa Kosaka, HORIBA STEC, Co., Ltd. (Japan)
Ryosuke Ogaki, HORIBA STEC, Co., Ltd. (Japan)
Yukio Kawaguchi, HORIBA STEC, Co., Ltd. (Japan)
Tetsuo Shimizu, HORIBA STEC, Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 10146:
Advances in Patterning Materials and Processes XXXIV
Christoph K. Hohle, Editor(s)

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