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Proceedings Paper

Efficient DSA-DP hybrid lithography conflict detection and guiding template assignment
Author(s): Jiaojiao Ou; Brian Cline; Greg Yeric; David Z. Pan
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Paper Abstract

In recent years, directed self-assembly (DSA) has demonstrated tremendous potential to reduce cost for multiple patterning with fewer masks, especially for via patterning. DSA is considered as one of the next generation lithography candidates or complementary lithography techniques to extend 193i lithography further for the sub- 7 nm nodes. In this work, we focus on the simultaneous DSA guiding template assignment and decomposition with DSA and double patterning (DSA-DP) hybrid lithography for 7nm technology node. We first analyze the placement error of DSA patterns with different shapes and sizes. We then propose a graph-based approach to reduce the problem size and solve the problem more efficiently without affecting the optimality of the results. The experimental results demonstrate that we can achieve a 50% reduction in both the number of variables and constraints compared to previous work, which leads to a 50X speed up in runtime.

Paper Details

Date Published: 28 March 2017
PDF: 9 pages
Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 101480C (28 March 2017); doi: 10.1117/12.2258156
Show Author Affiliations
Jiaojiao Ou, The Univ. of Texas at Austin (United States)
Brian Cline, ARM Inc. (United States)
Greg Yeric, ARM Inc. (United States)
David Z. Pan, The Univ. of Texas at Austin (United States)


Published in SPIE Proceedings Vol. 10148:
Design-Process-Technology Co-optimization for Manufacturability XI
Luigi Capodieci; Jason P. Cain, Editor(s)

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