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Proceedings Paper

Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for sub-20nm metal routing
Author(s): Lynn T. - N. Wang; Uwe Paul Schroeder; Sriram Madhavan
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Paper Abstract

A pattern-based methodology for optimizing SADP-compliant layout designs is developed based on identifying cut mask patterns and replacing them with pre-characterized fixing solutions. A pattern-based library of difficult-tomanufacture cut patterns with pre-characterized fixing solutions is built. A pattern-based engine searches for matching patterns in the decomposed layouts. When a match is found, the engine opportunistically replaces the detected pattern with a pre-characterized fixing solution. The methodology was demonstrated on a 7nm routed metal2 block. A small library of 30 cut patterns increased the number of more manufacturable cuts by 38% and metal-via enclosure by 13% with a small parasitic capacitance impact of 0.3%.

Paper Details

Date Published: 30 March 2017
PDF: 8 pages
Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 1014804 (30 March 2017); doi: 10.1117/12.2258061
Show Author Affiliations
Lynn T. - N. Wang, GLOBALFOUNDRIES Inc. (United States)
Uwe Paul Schroeder, GLOBALFOUNDRIES Inc. (United States)
Sriram Madhavan, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 10148:
Design-Process-Technology Co-optimization for Manufacturability XI
Luigi Capodieci; Jason P. Cain, Editor(s)

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