Share Email Print
cover

Proceedings Paper

Evaluating structure in thin block copolymer films with soft x-rays (Conference Presentation)
Author(s): Daniel Sunday; Christopher Liman; Adam F. Hannon; Jiaxing Ren; Xuanxuan Chen; Hyo Seon Suh; Juan J. de Pablo; Paul F. Nealey; R. Joseph Kline

Paper Abstract

The semiconductor industry is evaluating a variety of approaches for the cost efficient production of future processing and memory generations. Amongst the technologies being explored are multiple patterning steps, extreme ultraviolet (EUV) lithography, multiple-beam electron beam lithography and the directed self-assembly (DSA) of block copolymers (BCPs). BCP DSA utilizes a chemical or topographical template to induce long range order in a thin film of BCP which enhances the resolution of the original pattern. The characterization of buried structure within a DSA BCP film is challenging due to the lack of contrast between the organic materials. Critical-dimension small angle x-ray scattering (CDSAXS) measurements were performed on DSA BCP films, using soft X-rays to tune the contrast, in order to understand the relationship between template structure and film morphology.1 The results of these measurements show that as the width of the guiding stripe widens the arrangement of the BCP on the guiding stripe inverts, shifting from the A block being centered on the guiding stripe to the B block being centered on the guiding stripe. The initial results of integration of mean field simulations into the analysis of scattering data will also be discussed. In addition to examining the BCP structure with CDSAXS, soft X-ray reflectivity2 measurements were performed on BCP to better understand the relationship between interface width for systems with alternative architectures (triblocks) and additives (polymers/ionic liquids). The addition of a selectively associating additive increases the interaction parameter between the two blocks, resulting in the reduction of the interface width and access to smaller pitches. The use of soft X-ray reflectivity allows the evaluation of the distribution of the additive. (1) Sunday, D. F.; Hammond, M. R.; Wang, C.; Wu, W.; Delongchamp, D. M.; Tjio, M.; Cheng, J. Y.; Kline, R. J.; Pitera, J. W. Determination of the Internal Morphology of Nanostructures Patterned by Directed Self Assembly. ACS Nano 2014, 8, 8426–8437. (2) Sunday, D. F.; Kline, R. J. Reducing Block Copolymer Interfacial Widths through Polymer Additives. Macromolecules 2015, 48, 679–686.

Paper Details

Date Published: 25 May 2017
PDF: 1 pages
Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 1014612 (25 May 2017); doi: 10.1117/12.2258047
Show Author Affiliations
Daniel Sunday, National Institute of Standards and Technology (United States)
Christopher Liman, National Institute of Standards and Technology (United States)
Adam F. Hannon, National Institute of Standards and Technology (United States)
Jiaxing Ren, The Univ. of Chicago (United States)
Xuanxuan Chen, The Univ. of Chicago (United States)
Hyo Seon Suh, The Univ. of Chicago (United States)
Juan J. de Pablo, The Univ. of Chicago (United States)
Paul F. Nealey, The Univ. of Chicago (United States)
R. Joseph Kline, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 10146:
Advances in Patterning Materials and Processes XXXIV
Christoph K. Hohle, Editor(s)

© SPIE. Terms of Use
Back to Top