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Proceedings Paper

Single exposure EUV patterning of BEOL metal layers on the IMEC iN7 platform
Author(s): V. M. Blanco Carballo; J. Bekaert; M. Mao; B. Kutrzeba Kotowska; S. Larivière; I. Ciofi; R. Baert; R. H. Kim; E. Gallagher; E. Hendrickx; L. E. Tan; W. Gillijns; D. Trivkovic; P. Leray; S. Halder; M. Gallagher; F. Lazzarino; S. Paolillo; D. Wan; A. Mallik; Y. Sherazi; G. McIntyre; M. Dusa; P. Rusu; T. Hollink; T. Fliervoet; F. Wittebrood
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Paper Abstract

This paper summarizes findings on the iN7 platform (foundry N5 equivalent) for single exposure EUV (SE EUV) of M1 and M2 BEOL layers. Logic structures within these layers have been measured after litho and after etch, and variability was characterized both with conventional CD-SEM measurements as well as Hitachi contouring method. After analyzing the patterning of these layers, the impact of variability on potential interconnect reliability was studied by using MonteCarlo and process emulation simulations to determine if current litho/etch performance would meet success criteria for the given platform design rules.

Paper Details

Date Published: 24 March 2017
PDF: 10 pages
Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 1014318 (24 March 2017); doi: 10.1117/12.2258005
Show Author Affiliations
V. M. Blanco Carballo, IMEC (Belgium)
J. Bekaert, IMEC (Belgium)
M. Mao, IMEC (Belgium)
B. Kutrzeba Kotowska, IMEC (Belgium)
S. Larivière, IMEC (Belgium)
I. Ciofi, IMEC (Belgium)
R. Baert, IMEC (Belgium)
R. H. Kim, IMEC (Belgium)
E. Gallagher, IMEC (Belgium)
E. Hendrickx, IMEC (Belgium)
L. E. Tan, IMEC (Belgium)
W. Gillijns, IMEC (Belgium)
D. Trivkovic, IMEC (Belgium)
P. Leray, IMEC (Belgium)
S. Halder, IMEC (Belgium)
M. Gallagher, Vermont Technical College (United States)
F. Lazzarino, IMEC (Belgium)
S. Paolillo, IMEC (Belgium)
D. Wan, IMEC (Belgium)
A. Mallik, IMEC (Belgium)
Y. Sherazi, IMEC (Belgium)
G. McIntyre, IMEC (Belgium)
M. Dusa, ASML Netherlands B.V. (Netherlands)
P. Rusu, ASML Netherlands B.V. (Netherlands)
T. Hollink, ASML Netherlands B.V. (Netherlands)
T. Fliervoet, ASML Netherlands B.V. (Netherlands)
F. Wittebrood, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 10143:
Extreme Ultraviolet (EUV) Lithography VIII
Eric M. Panning, Editor(s)

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