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Proceedings Paper

Development of high heat resistant polyphenols applied to the spin-on carbon hardmask
Author(s): Tomoaki Takigawa; Junya Horiuchi; Naoya Uchiyama; Kana Okada; Yoko Shimizu; Takashi Makinoshima; Takashi Sato; Masatoshi Echigo
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Paper Abstract

In this paper, we report on new polyphenols synthesized by the condensation compounds of phenols and aldehydes. The phenols were 4,4'-biphenol, 2,6-dihydroxynaphthalene and 2,7-dihydroxynaphthalene. The aldehydes were 4- phenylbenzaldehyde and 4,4'-biphenyldicarbaldehyde. And we evaluated basic properties for the Spin-On Carbon Hardmask [1]. We recognized 4,4'-biphenol was showed good applicability to the best raw material of the phenols for polyphenol, and 2,6-dihydroxynaphthalene was showed good applicability to better raw material for polyphenol than 2,7-dihydroxynaphthalene. 4,4'-biphenyldicaraldehyde was better raw material of the aldehydes for polyphenols than 4- phenylbenzaldehyde, in solubility. As for heat resistance, 2,6-dihydroxynaphthalene was the best raw material of the phenols for polyphenols, 2,7-dihydroxynaphthalene was better raw material for polyphenols than 4,4'-biphenol. However, NF7177 synthesized by the condensation of 4,4’-biphenol and 4-phenylbenzaldehyde and NF7A78 synthesized by the condensation of 4,4'-biphenol and 4,4'-biphenyldicarbaldehyde seem to be crosslinking by heating, whence the heat resistance of the polyphenols using 4,4'-biphenol might be improved by optimizing heating condition. These materials are low molecular weight of less than 1000, so we expected having good planarization and gap filling.

Paper Details

Date Published: 27 March 2017
PDF: 7 pages
Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 1014626 (27 March 2017); doi: 10.1117/12.2257975
Show Author Affiliations
Tomoaki Takigawa, Mitsubishi Gas Chemical Co., Inc. (Japan)
Junya Horiuchi, Mitsubishi Gas Chemical Co., Inc. (Japan)
Naoya Uchiyama, Mitsubishi Gas Chemical Co., Inc. (Japan)
Kana Okada, Mitsubishi Gas Chemical Co., Inc. (Japan)
Yoko Shimizu, Mitsubishi Gas Chemical Co., Inc. (Japan)
Takashi Makinoshima, Mitsubishi Gas Chemical Co., Inc. (Japan)
Takashi Sato, Mitsubishi Gas Chemical Co., Inc. (Japan)
Masatoshi Echigo, Mitsubishi Gas Chemical Co., Inc. (Japan)


Published in SPIE Proceedings Vol. 10146:
Advances in Patterning Materials and Processes XXXIV
Christoph K. Hohle, Editor(s)

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