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Proceedings Paper

DSA process window expansion with novel DSA track hardware
Author(s): Masahiko Harumoto; Harold Stokes; Yuji Tanaka; Koji Kaneyama; Chalres Pieczulewski; Masaya Asai; Maxime Argoud; Isabelle Servin; Gaëlle Chamiot-Maitral; Guillaume Claveau; Raluca Tiron; Ian Cayrefourcq
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Paper Abstract

PS-b-PMMA block copolymer is a well-known DSA material, and there are many DSA patterning methods that make effective the use of such 1st generation materials. Consequently, this variety of patterning methods opens a wide array of possibilities for DSA application[1-4]. Last year, during the inaugural International DSA Symposium, researchers and lithographers concurred on common key issues for DSA patterning methods such as: defect density, LWR, placement error, etc. Defect density was specifically expressed as the biggest obstacle for new processes. Coat-Develop track systems contribute to the DSA pattern fabrication and also influence the DSA pattern performances[4]. In this study, defectivity was investigated using an atmosphere-controlled chamber on the SOKUDO DUO track. As an initial step for expanding the DSA process window, fingerprint patterns were used for various atmospheric conditions during DSA self-assembly annealing. In this study, we will demonstrate an improved DSA process window, and then we will discuss the mechanism for this atmospheric effect.

Paper Details

Date Published: 27 March 2017
PDF: 6 pages
Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101461X (27 March 2017); doi: 10.1117/12.2257945
Show Author Affiliations
Masahiko Harumoto, SCREEN Semiconductor Solutions Co., Ltd. (Japan)
Harold Stokes, SCREEN SPE Germany GmbH (Germany)
Yuji Tanaka, SCREEN Semiconductor Solutions Co., Ltd. (Japan)
Koji Kaneyama, SCREEN Semiconductor Solutions Co., Ltd. (Japan)
Chalres Pieczulewski, SCREEN Semiconductor Solutions Co., Ltd. (Japan)
Masaya Asai, SCREEN Semiconductor Solutions Co., Ltd. (Japan)
Maxime Argoud, CEA-LETI (France)
Isabelle Servin, CEA-LETI (France)
Gaëlle Chamiot-Maitral, CEA-LETI (France)
Guillaume Claveau, CEA-LETI (France)
Raluca Tiron, CEA-LETI (France)
Ian Cayrefourcq, Arkema S.A. (France)


Published in SPIE Proceedings Vol. 10146:
Advances in Patterning Materials and Processes XXXIV
Christoph K. Hohle, Editor(s)

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