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Performance analyses of plasmonic lithography
Author(s): Xi Chen; Gaofeng Liang; L. Jay Guo
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Paper Abstract

We analyzed the field contrast, aspect ratio, pattern uniformity as well as the line-edge roughness (LER) of the patterns fabricated in plasmonic lithography. Deep subwavelength patterns with high aspect-ratio and large-area uniformity were achieved by coupling the evanescent waves into an optical waveguide as well as the selection of a single high spatial frequency mode. In addition, the impacts of defects on photomasks and the surface roughness on thin films are studied in two exemplary plasmonic lithography systems: superlens and hyperbolic metamaterials (HMM). Superlens is capable of replicating arbitrary patterns, which also inherently make it vulnerable to roughness of the thin film and imperfections on the mask; while HMM system is more immune to such imperfections due to its spatial frequency selection function property.

Paper Details

Date Published: 28 March 2017
PDF: 14 pages
Proc. SPIE 10147, Optical Microlithography XXX, 101470U (28 March 2017); doi: 10.1117/12.2257912
Show Author Affiliations
Xi Chen, Univ. of Michigan (United States)
Gaofeng Liang, Univ. of Michigan (United States)
L. Jay Guo, Univ. of Michigan (United States)


Published in SPIE Proceedings Vol. 10147:
Optical Microlithography XXX
Andreas Erdmann; Jongwook Kye, Editor(s)

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