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Proceedings Paper

Extreme ultraviolet patterning of tin-oxo cages
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Paper Abstract

We report on the extreme ultraviolet (EUV) patterning performance of tin-oxo cages: molecular building blocks that are known to turn insoluble upon EUV exposure, thus having the properties of a negative tone photoresist. In this work, we focus on contrast curves of the materials using open-frame EUV exposures and their patterning capabilities using EUV interference lithography. It is shown that baking steps, such as post-exposure baking (PEB) can significantly affect both the sensitivity and contrast in the open-frame experiments as well as the patterning experiments. In addition, we show that the exchange of the anions of the cage can make a difference in terms of their physical properties. Our results demonstrate the significance of process optimization while evaluating the resist performance of novel molecular materials.

Paper Details

Date Published: 24 March 2017
PDF: 10 pages
Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 1014325 (24 March 2017); doi: 10.1117/12.2257911
Show Author Affiliations
Jarich Haitjema, Advanced Research Ctr. for Nanolithography (Netherlands)
Yu Zhang, Advanced Research Ctr. for Nanolithography (Netherlands)
Michaela Vockenhuber, Paul Scherrer Institut (Switzerland)
Dimitrios Kazazis, Paul Scherrer Institut (Switzerland)
Yasin Ekinci, Paul Scherrer Institut (Switzerland)
Albert M. Brouwer, Advanced Research Ctr. for Nanolithography (Netherlands)
Univ. of Amsterdam (Netherlands)


Published in SPIE Proceedings Vol. 10143:
Extreme Ultraviolet (EUV) Lithography VIII
Eric M. Panning, Editor(s)

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