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Proceedings Paper

A fast and efficient method for device level layout analysis
Author(s): YaoQi Dong; Elaine Zou; Jenny Pang; Lucas Huang; Legender Yang; Chunlei Zhang; Chunshan Du; Xinyi Hu; Qijian Wan
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Paper Abstract

There is an increasing demand for device level layout analysis, especially as technology advances. The analysis is to study standard cells by extracting and classifying critical dimension parameters. There are couples of parameters to extract, like channel width, length, gate to active distance, and active to adjacent active distance, etc. for 14nm technology, there are some other parameters that are cared about. On the one hand, these parameters are very important for studying standard cell structures and spice model development with the goal of improving standard cell manufacturing yield and optimizing circuit performance; on the other hand, a full chip device statistics analysis can provide useful information to diagnose the yield issue. Device analysis is essential for standard cell customization and enhancements and manufacturability failure diagnosis. Traditional parasitic parameters extraction tool like Calibre xRC is powerful but it is not sufficient for this device level layout analysis application as engineers would like to review, classify and filter out the data more easily. This paper presents a fast and efficient method based on Calibre equation-based DRC (eqDRC). Equation-based DRC extends the traditional DRC technology to provide a flexible programmable modeling engine which allows the end user to define grouped multi-dimensional feature measurements using flexible mathematical expressions. This paper demonstrates how such an engine and its programming language can be used to implement critical device parameter extraction. The device parameters are extracted and stored in a DFM database which can be processed by Calibre YieldServer. YieldServer is data processing software that lets engineers query, manipulate, modify, and create data in a DFM database. These parameters, known as properties in eqDRC language, can be annotated back to the layout for easily review. Calibre DesignRev can create a HTML formatted report of the results displayed in Calibre RVE which makes it easy to share results among groups. This method has been proven and used in SMIC PDE team and SPICE team.

Paper Details

Date Published: 30 March 2017
PDF: 10 pages
Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 101481E (30 March 2017); doi: 10.1117/12.2257895
Show Author Affiliations
YaoQi Dong, Semiconductor Manufacturing International Corp. (China)
Elaine Zou, Semiconductor Manufacturing International Corp. (China)
Jenny Pang, Semiconductor Manufacturing International Corp. (China)
Lucas Huang, Semiconductor Manufacturing International Corp. (China)
Legender Yang, Semiconductor Manufacturing International Corp. (China)
Chunlei Zhang, Semiconductor Manufacturing International Corp. (China)
Chunshan Du, Mentor Graphics Corp. (China)
Xinyi Hu, Mentor Graphics Corp. (China)
Qijian Wan, Mentor Graphics Corp. (China)


Published in SPIE Proceedings Vol. 10148:
Design-Process-Technology Co-optimization for Manufacturability XI
Luigi Capodieci; Jason P. Cain, Editor(s)

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