Share Email Print
cover

Proceedings Paper

High-accuracy measurement and compensation of grating line-density error in a tiled-grating compressor
Author(s): Dan Zhao; Xiao Wang; Jie Mu; Zhilin Li; Yanlei Zuo; Song Zhou; Kainan Zhou; Xiaoming Zeng; Jingqin Su; Qihua Zhu
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The grating tiling technology is one of the most effective means to increase the aperture of the gratings. The line-density error (LDE) between sub-gratings will degrade the performance of the tiling gratings, high accuracy measurement and compensation of the LDE are of significance to improve the output pulses characteristics of the tiled-grating compressor. In this paper, the influence of LDE on the output pulses of the tiled-grating compressor is quantitatively analyzed by means of numerical simulation, the output beams drift and output pulses broadening resulting from the LDE are presented. Based on the numerical results we propose a compensation method to reduce the degradations of the tiled grating compressor by applying angular tilt error and longitudinal piston error at the same time. Moreover, a monitoring system is setup to measure the LDE between sub-gratings accurately and the dispersion variation due to the LDE is also demonstrated based on spatial-spectral interference. In this way, we can realize high-accuracy measurement and compensation of the LDE, and this would provide an efficient way to guide the adjustment of the tiling gratings.

Paper Details

Date Published: 28 February 2017
PDF: 7 pages
Proc. SPIE 10256, Second International Conference on Photonics and Optical Engineering, 102562O (28 February 2017); doi: 10.1117/12.2257544
Show Author Affiliations
Dan Zhao, China Academy of Engineering Physics (China)
Science and Technology on Plasma Physics Lab. (China)
Graduate School of China Academy of Engineering Physics (China)
Xiao Wang, China Academy of Engineering Physics (China)
Science and Technology on Plasma Physics Lab. (China)
Shanghai Jiao Tong Univ. (China)
Jie Mu, China Academy of Engineering Physics (China)
Science and Technology on Plasma Physics Lab. (China)
Shanghai Jiao Tong Univ. (China)
Zhilin Li, China Academy of Engineering Physics (China)
Science and Technology on Plasma Physics Lab. (China)
Shanghai Jiao Tong Univ. (China)
Yanlei Zuo, China Academy of Engineering Physics (China)
Science and Technology on Plasma Physics Lab. (China)
Song Zhou, China Academy of Engineering Physics (China)
Science and Technology on Plasma Physics Lab. (China)
Kainan Zhou, China Academy of Engineering Physics (China)
Science and Technology on Plasma Physics Lab. (China)
Shanghai Jiao Tong Univ. (China)
Xiaoming Zeng, China Academy of Engineering Physics (China)
Science and Technology on Plasma Physics Lab. (China)
Jingqin Su, China Academy of Engineering Physics (China)
Science and Technology on Plasma Physics Lab. (China)
Qihua Zhu, China Academy of Engineering Physics (China)
Science and Technology on Plasma Physics Lab. (China)
Shanghai Jiao Tong Univ. (China)


Published in SPIE Proceedings Vol. 10256:
Second International Conference on Photonics and Optical Engineering
Chunmin Zhang; Anand Asundi, Editor(s)

© SPIE. Terms of Use
Back to Top