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Proceedings Paper

Application of actinic mask review system for the preparation of HVM EUV lithography with defect free mask
Author(s): Jihoon Na; Donggun Lee; Changhwan Do; Hong-seok Sim; Jung-Hwan Lee; Jungyoup Kim; Hwan-Seok Seo; Heebom Kim; Chan Uk Jeon
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Paper Abstract

We introduce an extreme ultraviolet lithography (EUVL) mask defect review system (EMDRS) which has been developing in SAMUSNG. It applies a stand-alone high harmonic generation (HHG) EUV source as well as simple EUV optics consisting of a folding mirror and a zoneplate. The EMDRS has been continuously updated and utilized for various applications regarding defect printability in EUVL. One of the main roles of the EMDRS is to verify either mask repair or mask defect avoidance (MDA) by actinic reviews of defect images before and after the process. Using the MDA, small phase defects could be hidden below absorber patterns, but it is very challenging in case of layouts with high density patterns. The EMDRS clearly verify the success of the MDA while conventional SEM could not detect the images. In addition, we emulate images of the sub-resolution assist features (SRAFs) by the EMDRS and compared them with the wafer exposure results.

Paper Details

Date Published: 28 March 2017
PDF: 8 pages
Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101450M (28 March 2017); doi: 10.1117/12.2257390
Show Author Affiliations
Jihoon Na, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Donggun Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Changhwan Do, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hong-seok Sim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jung-Hwan Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jungyoup Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hwan-Seok Seo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Heebom Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chan Uk Jeon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 10145:
Metrology, Inspection, and Process Control for Microlithography XXXI
Martha I. Sanchez, Editor(s)

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