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Proceedings Paper

Development of novel purifiers with appropriate functional groups based on solvent polarities at bulk filtration
Author(s): Tetsu Kohyama; Fumiya Kaneko; Saksatha Ly; James Hamzik; Jad Jaber; Yoshiaki Yamada
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Paper Abstract

Weak-polar solvents like PGMEA (Propylene Glycol Monomethyl Ether Acetate) or CHN (Cyclohexanone) are used to dissolve hydrophobic photo-resist polymers, which are challenging for traditional cleaning methods such as distillation, ion-exchange resins service or water-washing processes. This paper investigated two novel surface modifications to see their effectiveness at metal removal and to understand the mechanism. The experiments yielded effective purification methods for metal reduction, focusing on solvent polarities based on HSP (Hansen Solubility Parameters), and developing optimal purification strategies.

Paper Details

Date Published: 27 March 2017
PDF: 7 pages
Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101461J (27 March 2017); doi: 10.1117/12.2257388
Show Author Affiliations
Tetsu Kohyama, Nihon Entegris K.K. (Japan)
Fumiya Kaneko, Nihon Entegris K.K. (Japan)
Saksatha Ly, Entegris, Inc. (United States)
James Hamzik, Entegris Inc. (United States)
Jad Jaber, Entegris, Inc. (United States)
Yoshiaki Yamada, Nihon Entegris K.K. (Japan)


Published in SPIE Proceedings Vol. 10146:
Advances in Patterning Materials and Processes XXXIV
Christoph K. Hohle, Editor(s)

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