Share Email Print
cover

Proceedings Paper

Sol-gel preparation of silica and titania thin films
Author(s): Tomáš Thoř; Jan Václavík
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Thin films of silicon dioxide (SiO2) and titanium dioxide (TiO2) for application in precision optics prepared via the solgel route are being investigated in this paper. The sol-gel process presents a low cost approach, which is capable of tailoring thin films of various materials in optical grade quality. Both SiO2 and TiO2 are materials well known for their application in the field of anti-reflective and also highly reflective optical coatings. For precision optics purposes, thickness control and high quality of such coatings are of utmost importance. In this work, thin films were deposited on microscope glass slides substrates using the dip-coating technique from a solution based on alkoxide precursors of tetraethyl orthosilicate (TEOS) and titanium isopropoxide (TIP) for SiO2 and TiO2, respectively. As-deposited films were studied using spectroscopic ellipsometry to determine their thickness and refractive index. Using a semi-empirical equation, a relationship between the coating speed and the heat-treated film thickness was described for both SiO2 and TiO2 thin films. This allows us to control the final heat-treated thin film thickness by simply adjusting the coating speed. Furthermore, films’ surface was studied using the white-light interferometry. As-prepared films exhibited low surface roughness with the area roughness parameter Sq being on average of 0.799 nm and 0.33 nm for SiO2 and TiO2, respectively.

Paper Details

Date Published: 11 November 2016
PDF: 6 pages
Proc. SPIE 10151, Optics and Measurement International Conference 2016, 101511A (11 November 2016); doi: 10.1117/12.2257325
Show Author Affiliations
Tomáš Thoř, Institute of Plasma Physics of the ASCR, v.v.i. (Czech Republic)
Jan Václavík, Institute of Plasma Physics of the ASCR, v.v.i. (Czech Republic)


Published in SPIE Proceedings Vol. 10151:
Optics and Measurement International Conference 2016
Jana Kovacicinova, Editor(s)

© SPIE. Terms of Use
Back to Top