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Proceedings Paper

Overlay control for nanoimprint lithography
Author(s): Kazuya Fukuhara; Masato Suzuki; Masaki Mitsuyasu; Takuya Kono; Tetsuro Nakasugi; Yonghyun Lim; Wooyung Jung
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Paper Abstract

Nanoimprint lithography (NIL) is a promising technique for fine-patterning with a lower cost than other lithography techniques such as EUV or immersion with multi-patterning. NIL has the potential of "single" patterning for both line patterns and hole patterns with a half-pitch of less than 20nm. NIL tools for semiconductor manufacturing employ die-by-die alignment system with moiré fringe detection which gives alignment measurement accuracy of below 1nm.

In this paper we describe the evaluation results of NIL the overlay performance using an up-to-date NIL tool for 300mm wafer. We show the progress of both "NIL-to-NIL" and "NIL-to-optical tool" distortion matching techniques. From these analyses based on actual NIL overlay data, we discuss the possibility of NIL overlay evolution to realize an on-product overlay accuracy to 3nm and beyond.

Paper Details

Date Published: 3 April 2017
PDF: 8 pages
Proc. SPIE 10144, Emerging Patterning Technologies, 1014409 (3 April 2017); doi: 10.1117/12.2256715
Show Author Affiliations
Kazuya Fukuhara, Toshiba Corp. (Japan)
Masato Suzuki, Toshiba Corp. (Japan)
Masaki Mitsuyasu, Toshiba Corp. (Japan)
Takuya Kono, Toshiba Corp. (Japan)
Tetsuro Nakasugi, Toshiba Corp. (Japan)
Yonghyun Lim, SK Hynix, Inc. (Korea, Republic of)
Wooyung Jung, SK Hynix, Inc. (Korea, Republic of)


Published in SPIE Proceedings Vol. 10144:
Emerging Patterning Technologies
Christopher Bencher, Editor(s)

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