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Proceedings Paper

Development of a dynamic interferometric focusing system for femtosecond laser machining
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Paper Abstract

Taking advantage of the inherent characteristics of femtosecond laser used for machining, we developed an interferometric system able to evaluate and correct the focal position with an accuracy of a few microns, implementing a technique based on low coherence interferometry. This approach measures at the exact spot that the laser is machining, in real time, and is sensitive to any sample that acts as a scatterer to the wavelength in use. The experimental evaluation was divided in two steps: in the first a system based on a superluminescent LED was mounted to check the viability and develop the controlling software; in the second part a setup was mounted employing a femtosecond laser, and several kinds of samples using the active focus control, among which the results obtained with glass sample and a bovine tooth are meticulously described in this paper. The system was able to improve the performance in both samples, keeping them in the confocal region for an extended positioning range, resulting in better engraving by the laser.

Paper Details

Date Published: 17 February 2017
PDF: 13 pages
Proc. SPIE 10094, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVII, 100940N (17 February 2017); doi: 10.1117/12.2256559
Show Author Affiliations
Marcus Paulo Raele, Nuclear and Energy Research Institute (Brazil)
Lucas Ramos De Pretto, Nuclear and Energy Research Institute (Brazil)
Ricardo Elgul Samad, Nuclear and Energy Research Institute (Brazil)
Anderson Zanardi de Freitas, Nuclear and Energy Research Institute (Brazil)
Wagner de Rossi, Nuclear and Energy Research Institute (Brazil)
Nilson Dias Vieira Junior, Nuclear and Energy Research Institute (Brazil)
Niklaus Ursus Wetter, Nuclear and Energy Research Institute (Brazil)


Published in SPIE Proceedings Vol. 10094:
Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVII
Alexander Heisterkamp; Peter R. Herman; Michel Meunier; Roberto Osellame, Editor(s)

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