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Proceedings Paper

LOPA-based direct laser writing of multi-dimensional and multi-functional photonic submicrostructures
Author(s): Fei Mao; Quang Cong Tong; Dam Thuy Trang Nguyen; Au Thi Huong; Rachel Odessey; Florent Saudrais; Ngoc Diep Lai
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Paper Abstract

We have recently developed a simple fabrication technique, called low one-photon absorption (LOPA) direct laser writing (DLW), to realize multi-dimensional and multi-functional polymer-based photonic submicrostructures. This technique employs a continuous-wave laser at 532 nm-wavelength with only few milliwatts and a simple optical setup, allowing to decrease the cost of the fabrication system by a factor of ten as compared to a commercial DLW system. In this report, we present various photonic structures, such as 2D and 3D micro- resonators, photonic and magnetic submicrostructures, and nonlinear optical structures fabricated by this LOPA- based DLW method. We also discuss about potential applications of those fabricated multi-dimensional and multi-functional photonic submicrostructures in opto-electronics, bio, as well as in opto-mechanics.

Paper Details

Date Published: 20 February 2017
PDF: 8 pages
Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 1011509 (20 February 2017); doi: 10.1117/12.2253741
Show Author Affiliations
Fei Mao, Lab. de Photonique Quantique et Moléculaire, CNRS (France)
Quang Cong Tong, Lab. de Photonique Quantique et Moléculaire, CNRS (France)
Vietnam Academy of Science and Technology (Viet Nam)
Dam Thuy Trang Nguyen, Lab. de Photonique Quantique et Moléculaire, CNRS (France)
Au Thi Huong, Lab. de Photonique Quantique et Moléculaire, CNRS (France)
Rachel Odessey, Lab. de Photonique Quantique et Moléculaire, CNRS (France)
Florent Saudrais, Lab. de Photonique Quantique et Moléculaire, CNRS (France)
Ngoc Diep Lai, Lab. de Photonique Quantique et Moléculaire, CNRS (France)


Published in SPIE Proceedings Vol. 10115:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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