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Proceedings Paper

Holographic fabrication of hole arrays in AZO for study of surface plasmon resonances
Author(s): David George; Safaa Hassan; Murthada Adewole; David Lowell; Li Li; Jun Ding; Jingbiao Cui; Hualiang Zhang; Usha Philipose; Yuankun Lin
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Paper Abstract

Transparent conducting oxides are part of a robust material class that is capable of supporting near-IR surface plasmon resonances (SPRs) which are strongly dependent on size, structure, and doping of the material. This study presents the implementation of holographic lithography to structure large area square lattice cylindrical hole arrays on the transparent conducting oxide thin film, aluminum doped zinc oxide (AZO). For fabricated structures on a glass substrate, SPR are indirectly measured by FTIR transmission and verified with electromagnetic simulations using a finite difference time domain method. Furthermore, it is shown that the SPR excited are standing wave resonances in the (1,1) direction of the lattice array located at the interface of the patterned AZO and glass substrate. This research extends the robust CMOS compatible fabrication techniques of holographic lithography into tunable conductive materials,and contributes to the core technology of future integrated photonics.

Paper Details

Date Published: 28 February 2017
PDF: 8 pages
Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 1011518 (28 February 2017); doi: 10.1117/12.2253158
Show Author Affiliations
David George, Univ. of North Texas (United States)
Safaa Hassan, Univ. of North Texas (United States)
Murthada Adewole, Univ. of North Texas (United States)
David Lowell, Univ. of North Texas (United States)
Li Li, The Univ. of Memphis (United States)
Jun Ding, Univ. of Massachusetts Lowell (United States)
Jingbiao Cui, The Univ. of Memphis (United States)
Hualiang Zhang, Univ. of Massachusetts Lowell (United States)
Usha Philipose, Univ. of North Texas (United States)
Yuankun Lin, Univ. of North Texas (United States)


Published in SPIE Proceedings Vol. 10115:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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