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Proceedings Paper

CVD silicon carbide mirrors for EUV applications
Author(s): Ritva A. M. Keski-Kuha; John F. Osantowski; Douglas B. Leviton; Timo T. Saha; Geraldine A. Wright; Rene A. Boucarut; Charles M. Fleetwood; Timothy J. Madison
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Paper Abstract

Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency in the extreme ultraviolet (EUV). For example, the development of chemical vapor deposited (CVD) SiC mirrors provides an opportunity to extend the range of normal incidence instruments down to 60 nm. CVD-SiC is a highly polishable material yielding low scatter surfaces. High UV reflectivity and desirable mechanical and thermal properties make CVD-SiC an attractive mirror and/or coating material for EUV applications. The EUV performance of SiC mirrors as well as some strengths and problem areas are discussed.

Paper Details

Date Published: 23 October 1995
PDF: 7 pages
Proc. SPIE 2543, Silicon Carbide Materials for Optics and Precision Structures, (23 October 1995); doi: 10.1117/12.225286
Show Author Affiliations
Ritva A. M. Keski-Kuha, NASA Goddard Space Flight Ctr. (United States)
John F. Osantowski, NASA Goddard Space Flight Ctr. (United States)
Douglas B. Leviton, NASA Goddard Space Flight Ctr. (United States)
Timo T. Saha, NASA Goddard Space Flight Ctr. (United States)
Geraldine A. Wright, NASA Goddard Space Flight Ctr. (United States)
Rene A. Boucarut, NASA Goddard Space Flight Ctr. (United States)
Charles M. Fleetwood, NASA Goddard Space Flight Ctr. (United States)
Timothy J. Madison, NASA Goddard Space Flight Ctr. (United States)


Published in SPIE Proceedings Vol. 2543:
Silicon Carbide Materials for Optics and Precision Structures
Mark A. Ealey, Editor(s)

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