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Proceedings Paper

KrF-excimer-laser-induced absorption and fluorescence bands in fused silica related to the manufacturing process
Author(s): Norbert Leclerc; Christoph Pfleiderer; Hermine Hitzler; Stephan Thomas; Ralf Takke; Wolfgang R. Englisch; Juergen M. Wolfrum; Karl-Otto Greulich
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Paper Abstract

Transient and permanent UV absorption bands and fluorescence bands induced by 248 nm excimer laser radiation in fused silica are reported. It is shown that the permanent absorption measurements are not suitable to characterize the material with respect to transmission of high power laser pulses. In fused silica samples with high OH - content recovery of the 210 nm absorption band is observed after the end of irradiation. In samples with low OH - content no quick re covery is observed. 1 .

Paper Details

Date Published: 1 October 1990
PDF: 9 pages
Proc. SPIE 1327, Properties and Characteristics of Optical Glass II, (1 October 1990); doi: 10.1117/12.22519
Show Author Affiliations
Norbert Leclerc, Ruprecht Karls Univ. (Germany)
Christoph Pfleiderer, Ruprecht Karls Univ. (Germany)
Hermine Hitzler, Ruprecht Karls Univ. (Germany)
Stephan Thomas, Heraeus Quarzglas GmbH (Germany)
Ralf Takke, Heraeus Quarzglas GmbH (Germany)
Wolfgang R. Englisch, Heraeus Quarzglas GmbH (Germany)
Juergen M. Wolfrum, Ruprecht Karls Univ. (Germany)
Karl-Otto Greulich, Ruprecht Karls Univ. (Germany)


Published in SPIE Proceedings Vol. 1327:
Properties and Characteristics of Optical Glass II
Alexander J. Marker, Editor(s)

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