Share Email Print
cover

Proceedings Paper

Fabrication and characterization of silicon-based 3D electrodes for high-energy lithium-ion batteries
Author(s): Y. Zheng; P. Smyrek; J.-H. Rakebrandt; Ch. Kübel; H. J. Seifert; W. Pfleging
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

For next generation of high energy lithium-ion batteries, silicon as anode material is of great interest due to its higher specific capacity (3579 mAh/g). However, the volume change during de-/intercalation of lithium-ions can reach values up to 300 % causing particle pulverization, loss of electrical contact and even delimitation of the composite electrode from the current collector. In order to overcome these drawbacks for silicon anodes we are developing new 3D electrode architectures. Laser nano-structuring of the current collectors is developed for improving the electrode adhesion and laser micro-structuring of thick film composite electrodes is applied for generating of freestanding structures. Freestanding structures could be attributed to sustain high volume changes during electrochemical cycling and to improve the capacity retention at high C-rates (> 0.5 C). Thick film composite Si and Si/graphite anode materials with different silicon content were deposited on current collectors by tape-casting. Film adhesion on structured current collectors was investigated by applying the 90° peel-off test. Electrochemical properties of cells with structured and unstructured electrodes were characterized. The impact of 3D electrode architectures regarding cycle stability, capacity retention and cell life-time will be discussed in detail.

Paper Details

Date Published: 20 February 2017
PDF: 8 pages
Proc. SPIE 10092, Laser-based Micro- and Nanoprocessing XI, 100920L (20 February 2017); doi: 10.1117/12.2251374
Show Author Affiliations
Y. Zheng, Karlsruhe Institute of Technology (Germany)
P. Smyrek, Karlsruhe Institute of Technology (Germany)
Karlsruhe Nano Micro Facility (Germany)
J.-H. Rakebrandt, Karlsruhe Institute of Technology (Germany)
Ch. Kübel, Karlsruhe Institute of Technology (Germany)
H. J. Seifert, Karlsruhe Institute of Technology (Germany)
W. Pfleging, Karlsruhe Institute of Technology (Germany)


Published in SPIE Proceedings Vol. 10092:
Laser-based Micro- and Nanoprocessing XI
Udo Klotzbach; Kunihiko Washio; Rainer Kling, Editor(s)

© SPIE. Terms of Use
Back to Top