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Proceedings Paper

Laser nanolithography and pyrolysis of SZ2080 hybrid for slowing light in 3D photonic crystals
Author(s): Darius Gailevicius; Linas Jonušauskas; Danas Sakalauskas; Zeki Hayran; Hamza Kurt; Mirbek Turduev; Simas Šakirzanovas; Saulius Juodkazis; Vygantas Mizeikis; Roaldas Gadonas; Kestutis Staliunas; Mangirdas Malinauskas
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Paper Abstract

In this work we explore a possibility to apply ultrafast 3D laser nanolithography in conjunction with pyrolysis to acquire glass-ceramic 3D structures in micro- and nano-scale. Laser fabrication allows for production of initial 3D structures with relatively small (hundreds nm - μm) feature sizes out of SZ2080 hybrid material. Then, postfabrication heating at 600°C in Ar atmosphere decomposes organic part of the material leaving the glass-ceramic component of the hybrid. Resulting structures are uniformly shrunk by 40%. This brings us one step closer to fabricating highly efficient slow-light absorbers.

Paper Details

Date Published: 20 February 2017
PDF: 8 pages
Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 1011511 (20 February 2017); doi: 10.1117/12.2250537
Show Author Affiliations
Darius Gailevicius, Vilnius Univ. (Lithuania)
Linas Jonušauskas, Vilnius Univ. (Lithuania)
Danas Sakalauskas, Vilnius Univ. (Lithuania)
Zeki Hayran, TOBB Univ. of Economics and Technology (Turkey)
Hamza Kurt, TOBB Univ. of Economics and Technology (Turkey)
Mirbek Turduev, TED Univ. (Turkey)
Simas Šakirzanovas, Vilnius Univ. (Lithuania)
Saulius Juodkazis, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)
Vygantas Mizeikis, Shizuoka Univ. (Japan)
Roaldas Gadonas, Vilnius Univ. (Lithuania)
Kestutis Staliunas, Univ. Politècnica de Catalunya (Spain)
Institució Catalana de Recerca i Estudis Avançats (Spain)
Mangirdas Malinauskas, Vilnius Univ. (Lithuania)


Published in SPIE Proceedings Vol. 10115:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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