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Proceedings Paper

Hybrid metal-dielectric nanostructures for advanced light-field manipulation (Conference Presentation)
Author(s): Isabelle Staude; Rui Guo; Evgenia Rusak; Jason Dominguez; Manuel Decker; Carsten Rockstuhl; Igal Brener; Dragomir N. Neshev; Thomas Pertsch; Yuri S. Kivshar
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Paper Abstract

All-dielectric and plasmonic nanostructures have complementary advantages regarding their capabilities for controlling light fields at the nanoscale [1]. While all-dielectric nanostructures can provide near-unity efficiency, plasmonic nanostructures are more compact and offer strong near-field enhancement. Combination of photonic nanostructures of both types offers a promising route towards compact optical elements that unify low absorption losses with small footprints, while at the same time providing a high versatility in engineering the optical response of the hybrid system towards specific functionalities. This talk aims to review our recent progress in coupling designed plasmonic nanoantennas to high-index dielectric nanostructures. Following a general analysis of coupling of plasmonic and high-refractive-index dielectric nanoresonators, various specific hybrid nanostructure designs will be discussed. For the fabrication of designed hybrid metal-dielectric nanostructures we use a two-step electron-beam lithography (EBL) procedure [2]. The first step of EBL is used in combination with reactive-ion etching to define the dielectric nanostructures. The second step of EBL is followed by evaporation of gold and a lift-off process, and serves to define the plasmonic elements. Between the two steps, a precision alignment procedure is performed in order to allow for the precise positioning of the gold nanostructures with respect to the silicon nanostructures. Using this approach, we realize and optically characterize various hybrid metal-dielectric nanostructures designed to support a range of novel functionalities, including directional emission enhancement [2] and on-chip light routing. [1] E. Rusak et al., Appl. Phys. Lett. 105, 221109 (2014). [2] R. Guo et al., ACS Photonics 3, 349–353 (2016).

Paper Details

Date Published: 28 April 2017
PDF: 1 pages
Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 101150A (28 April 2017); doi: 10.1117/12.2250310
Show Author Affiliations
Isabelle Staude, Friedrich-Schiller-Univ. Jena (Germany)
Rui Guo, The Australian National Univ. (Australia)
Evgenia Rusak, Karlsruher Institut für Technologie (Germany)
Jason Dominguez, Sandia National Labs. (United States)
Manuel Decker, The Australian National Univ. (Australia)
Carsten Rockstuhl, Karlsruher Institut für Technologie (Germany)
Igal Brener, Sandia National Labs. (United States)
Dragomir N. Neshev, The Australian National Univ. (Australia)
Thomas Pertsch, Friedrich-Schiller-Univ. Jena (Germany)
Yuri S. Kivshar, The Australian National Univ. (Australia)


Published in SPIE Proceedings Vol. 10115:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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