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Proceedings Paper

Partial etch phase (PEP) optical elements for high-volume applications
Author(s): T. W. Mossberg; J. M. Hannigan; D. Iazikov
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Paper Abstract

Using binary etch and sub-wavelength DUV photolithography, we have designed and fabricated a variety of flat optical devices (lenses, vortex phase plates, vortex plus lens, and diffusers) useful in telecommunications and other areas. The devices provide the precision and low cost associated with modern semi-conductor manufacturing and offer unique functional performance. Since the design method involves selective binary removal of substrate material we designate derivative devices partial etch phase (PEP) devices. Design principles and fabricated device performance are described.

Paper Details

Date Published: 20 February 2017
PDF: 7 pages
Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 1011504 (20 February 2017); doi: 10.1117/12.2250038
Show Author Affiliations
T. W. Mossberg, LightSmyth Technologies, Inc. (United States)
J. M. Hannigan, LightSmyth Technologies, Inc. (United States)
D. Iazikov, LightSmyth Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 10115:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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