Share Email Print
cover

Proceedings Paper

CD process control through machine learning
Author(s): Clemens Utzny
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

For the specific requirements of the 14nm and 20nm site applications a new CD map approach was developed at the AMTC. This approach relies on a well established machine learning technique called recursive partitioning. Recursive partitioning is a powerful technique which creates a decision tree by successively testing whether the quantity of interest can be explained by one of the supplied covariates. The test performed is generally a statistical test with a pre-supplied significance level. Once the test indicates significant association between the variable of interest and a covariate a split performed at a threshold value which minimizes the variation within the newly attained groups. This partitioning is recurred until either no significant association can be detected or the resulting sub group size falls below a pre-supplied level.

Paper Details

Date Published: 20 October 2016
PDF: 9 pages
Proc. SPIE 10032, 32nd European Mask and Lithography Conference, 100320R (20 October 2016); doi: 10.1117/12.2248903
Show Author Affiliations
Clemens Utzny, Advanced Mask Technology Ctr. GmbH and Co. KG (Germany)


Published in SPIE Proceedings Vol. 10032:
32nd European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

© SPIE. Terms of Use
Back to Top