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Proceedings Paper

High performance gratings for DFB lasers fabricated by direct-write e-beam lithography
Author(s): R. Steingrüber; Z. Zhang
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Paper Abstract

The fabrication of high performance gratings for distributed feedback (DFB) lasers by direct-write (DW) electron-beam lithography (EBL) is presented. This paper starts with a short introduction of the grating theory and various types of gratings commonly used in DFB lasers, laying out resolution requirements and other fabrication challenges. The development and optimization process of the adopted EBL technology is then disclosed to address these challenges. In the end, the state-of-the-art laser performance is demonstrated, validating the technology and also paving ways for more advanced applications in the modern optical networks. We concentrate on grating fabrication technology of DFB lasers for telecommunication applications as the technology has been continuously developed at Fraunhofer Heinrich Hertz Institute (HHI) for more than two decades.

Paper Details

Date Published: 20 October 2016
PDF: 6 pages
Proc. SPIE 10032, 32nd European Mask and Lithography Conference, 100320C (20 October 2016); doi: 10.1117/12.2248862
Show Author Affiliations
R. Steingrüber, Fraunhofer Institute for Telecommunications (Germany)
Z. Zhang, Fraunhofer Institute for Telecommunications (Germany)


Published in SPIE Proceedings Vol. 10032:
32nd European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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